| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1666944 | Thin Solid Films | 2012 | 5 Pages |
Abstract
Capacitively coupled plasma (CCP) is one of the most common industrial plasma sources. Experimental characterization plays key roles in understanding the complex physics involved in CCP, and is based on various probes, optical monitoring and mass spectrometry. Some recent configurations of capacitive discharge like dual frequency CCP, direct current CCP and electric asymmetric CCP have been extensively studied experimentally with these methods. In this paper, we review these recent experimental progresses of CCP studies.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Yong-Xin Liu, Wei Jiang, Xiao-Song Li, Wen-Qi Lu, You-Nian Wang,