Magnetron sputtering of Zr–Si–C thin films

The phase composition and chemical bonding of ZrC and ZrSiC films deposited by magnetron sputtering has been studied. The results show that the binary Zr–C films at higher carbon contents form nanocrystallites of ZrC in an amorphous carbon matrix. The addition of Si induces a complete amorphization of the films above a critical concentration of about 15 at.%. X-ray diffraction and transmission electron microscopy confirm that the amorphous films contain no nanocrystallites and therefore can be described as truly amorphous carbides. The amorphous films are thermally stable but start to crystallize above 500 °C. Analysis of the chemical bonding with X-ray photoelectron spectroscopy suggests that the amorphous films exhibit a mixture of different chemical bonds such as ZrC, ZrSi and SiC and that the electrical and mechanical properties are dependent on the distribution of these bonds. For higher carbon contents, strong SiC bonds are formed in the amorphous Zr–Si–C films making them harder than the corresponding binary Zr–C films.

►Sputtered Zr–Si–C thin films are completely amorphous at a Si content of 30 at.%. ►The material properties are highly dependent on the SiC bond amount in the film. ►The hardness of the Zr–Si–C films increases with increasing carbon content.