| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1667046 | Thin Solid Films | 2012 | 5 Pages |
We present here results on samarium oxide thin films, obtained by pulsed laser deposition and by radio frequency assisted pulsed laser deposition. Three different substrate types were used: silicon, platinum covered silicon and titanium covered silicon. The influence of the deposition parameters (oxygen pressure and laser fluence) on the structure and morphology of the thin films was studied. The substrate-thin film interface zone was investigated; the optical and electrical properties (the losses, dielectric constant and leakage currents) were also determined.
► We studied Sm2O3 thin films deposited by laser and plasma-assisted technique. ► Several substrates were used: silicon, and platinum- and titanium-covered silicon. ► The substrate-thin film interface was investigated with respect to composition. ► Morphological, optical and electrical characteristics of the films were determined.
