| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1667119 | Thin Solid Films | 2012 | 5 Pages |
Growth studies of sp2-hybridized boron nitride (BN) phases by thermal chemical vapor deposition (CVD) are presented; of particular interest is the presence of oxygen and water during growth. While Fourier transform infrared spectroscopy reveals the presence of BN bonds and elemental analysis by elastic recoil detection analysis shows that the films are close to stoichiometric, although containing a few atomic percent oxygen and hydrogen, X-ray diffraction measurements show no indications for nucleation of any crystalline BN phases, despite change in N/B-ratio and/or process temperature. Thermodynamic modeling suggests that this is due to formation of strong BO bonds already in the gas phase in the presence of water or oxygen during growth. This growth behavior is believed to be caused by an uncontrolled release of water and/or oxygen in the deposition chamber and highlights the sensitivity of the BN CVD process towards oxygen and water.
► Thermal chemical vapor deposition of sp2-hybridized boron nitride is studied. ► Amorphous, close to stoichiometric, sp2-hybridized boron nitride films are obtained. ► Thermodynamic modeling shows formation of strong BO bonds in the presence of water. ► Incorporation of water and/or oxygen disturbs the formation of crystalline BN.
