Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1667191 | Thin Solid Films | 2012 | 4 Pages |
Abstract
The aim of this work is to study the effects of deposition temperature and aluminium incorporation on the crystalline properties, orientation and grain size of atomic layer deposited ZnO layers. X-ray diffraction analysis revealed a change in the dominant crystallite orientation with increasing substrate temperature. The most perfect crystal structure and largest grain size was found at 2 at.% aluminium content. Accumulation of compressive strain developed a monotonous increase with the growth temperature. Electric resistivity showed no anisotropy despite the change in the orientation, therefore the dominant conduction mechanism is not grain boundary related.
Related Topics
Physical Sciences and Engineering
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Authors
Zs. Baji, Z. Lábadi, Z.E. Horváth, I. Bársony,