| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1667213 | Thin Solid Films | 2012 | 5 Pages |
Abstract
We used in-situ X-ray Photoelectron Spectroscopy (XPS) to study the oxidation process of a cluster-assembled metallic titanium film exposed to molecular oxygen at room temperature. The nanostructured film has been grown on a Si(111) substrate, in ultra high vacuum conditions, by coupling a supersonic cluster beam deposition system with an XPS experimental chamber. Our results show that upon in-situ oxygen exposure Ti3 + is the first oxidation state observed, followed by Ti4 +, whereas Ti2 + is practically absent during the whole process. Our results compare well with the existing literature on Ti films produced using other techniques.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Monica de Simone, Elena Snidero, Marcello Coreno, Gero Bongiorno, Luca Giorgetti, Matteo Amati, Cinzia Cepek,