| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1667247 | Thin Solid Films | 2012 | 5 Pages |
The 80-nm-thickness BaTiO3 (BT) thin film was prepared on the Pt/Ti/SiO2/Si substrate by the RF magnetron sputtering technique. The Pt/BT/Pt/Ti/SiO2/Si structure was investigated using X-ray diffraction and scanning electron microscopy. The current–voltage characteristic measurements were performed. The bipolar resistive switching behavior was found in the Pt/BT/Pt cell. The current–voltage curves were well fitted in different voltage regions at the high resistance state (HRS) and the low resistance state (LRS), respectively. The conduction mechanisms are concluded to be Ohmic conduction and Schottky emission at the LRS, while space-charge-limited conduction and Poole–Frenkel emission at the HRS. The electroforming and switching processes were explained in terms of the valence change mechanism, in which oxygen vacancies play a key role in forming conducting paths.
►Pt/BaTiO3/Pt cell shows the bipolar resistive switching behavior. ►The current–voltage curves were well fitted for different conduction mechanisms. ►The electroforming and switching processes were explained.
