Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1667318 | Thin Solid Films | 2012 | 5 Pages |
Abstract
To enhance the optical property of zinc oxide (ZnO) thin film, zinc sulfide (ZnS) thin films were formed on the interfaces of ZnO thin film as a passivation and a substrate layer. ZnO and ZnS thin films were deposited by atomic layer deposition (ALD) using diethyl zinc, H2O, and H2S as precursors. Investigations by X-ray diffraction and transmission electron microscopy showed that ZnS/ZnO/ZnS multi-layer thin films with clear boundaries were achieved by ALD and that each film layer had its own polycrystalline phase. The intensity of the photoluminescence of the ZnO thin film was enhanced as the thickness of the ZnO thin film increased and as ZnS passivation was applied onto the ZnO thin film interfaces.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Jeong-Yeon Hwang, Sung Youl Park, Jong-Ho Park, Jong-Nam Kim, Sang Man Koo, Chang Hyun Ko,