| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1667336 | Thin Solid Films | 2012 | 4 Pages |
X-ray amorphous V2AlC and hexagonal (V,Al)2Cx thin films were synthesized by magnetron sputtering from a compound target with the composition of V2AlC. The crystallization kinetics was investigated by differential scanning calorimetry (DSC) and X-ray diffraction (XRD). During continuous heating up to 1200 °C, one exothermal peak is observed between 565 and 675 °C. XRD data suggest that the DSC peak is associated with the formation of V2AlC. The activation energy of crystallization of V2AlC is ~ 308 kJ/mol based on the Kissinger approach. This value is close to the 287 kJ/mol activation energy obtained here for the transformation of magnetron sputtered (V,Al)2Cx thin films to V2AlC. The here reported phase formation temperature of V2AlC is about 800 °C lower than during hot pressing of elemental powders.
