Article ID Journal Published Year Pages File Type
1667619 Thin Solid Films 2012 5 Pages PDF
Abstract

Indium zinc tin oxide (IZTO) thin films with two different chemical compositions, i.e. IZTO15 and IZTO25, where In content was fixed at 60 at.% and Sn content was 15 and 25 at.%, respectively, were deposited onto alkaline-free glass substrate at temperature from 37 °C to 600 °C. The deposition process was carried out in argon using an RF magnetron sputter. After deposition, the films were annealed in argon atmosphere at 450 °C for 30 min. The effect of substrate temperature and annealing treatment was investigated, and the minimum resistivity value of 3.44 × 10− 4Ω.cm was obtained from the film deposited at 400 °C using IZTO25 target followed by rapid thermal annealing at 450 °C for 30 min. The average optical transmittance was kept fairly high over 80%. It was proven that both substrate temperature and thermal annealing were important parameters in lowering the electrical resistivity without deteriorating optical properties.

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