| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1667827 | Thin Solid Films | 2011 | 5 Pages |
Abstract
L10-FePt thin films were deposited on silicon substrates with the structure of Si/CrRu/MgO/FePt. The magnetic and microstructural properties were optimized by varying the FePt sputter pressure and temperature, as well as the thicknesses of all three layers. High coercivity films greater than 1.8 T were grown when the FePt sputter pressure was at 1.33 Pa with a thickness of only 4 nm, on CrRu and MgO underlayers as thin as 10 nm and 2 nm, respectively.
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Physical Sciences and Engineering
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Authors
R. Fernandez, N. Amos, C. Zhang, B. Lee, S. Khizroev,