Geometrical surface structure of ultra thin Al film on the W(110) surface

Using low energy electron diffraction (LEED) and low energy ion scattering spectroscopy (ISS) we investigated the structure of the surface of 1.0 monolayer (ML) Al/W(110) prepared by annealing at 900 K. A p(1 × 1) LEED image was acquired for the 1.0 ML Al/W(110) surface while the substrate temperature was maintained at 900 K during Al deposition. We found that, 1.0 ML Al atoms cover the W(110) surface uniformly, and do not form three-dimensional islands. We also measured the Al adsorption site at the 1.0 ML Al/W(110) surface using ISS. The ISS results show that the 1.0 ML Al/W(110) surface prepared by annealing at 900 K has two domains with a p(1 × 1) structure. The experiments reveal that the Al atoms were adsorbed at the centers of the hollow sites and are located ± 0.55 Å to the [11¯0] side, and the adsorption height was 2.13 Å above the W surface.