| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1668148 | Thin Solid Films | 2011 | 4 Pages |
Abstract
The control of very high frequency (VHF) discharge plasma at high pressures was attempted by loading a variable capacitor to the end of the multi rod electrode with which VHF plasma (frequency 60 MHz) was produced. It was found that the discharge region is controlled with the variable capacitor and VHF plasma uniform over 1 m is produced at high pressures.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Tatsuyuki Nishimiya, Tsukasa Yamane, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai,