Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1668780 | Thin Solid Films | 2009 | 7 Pages |
Abstract
BCxNy thin films deposited at 250 °C by pulsed reactive magnetron sputtering of a B4C target in an Ar/N2 plasma were studied by elastic recoil detection analysis, Fourier transform infrared, Raman, and photoelectron spectroscopy, electron microscopy, and nanoindentation. In the concentration range of 6% to 100% N2 in the sputter plasma the segregation into nanocrystalline hexagonal boron nitride and amorphous sp2 carbon is the dominant process during the film growth. The stoichiometric ratio and structural details of the major phases depend on the N2 concentration in the plasma and have significant influence on the Youngâ²s modulus and the elastic recovery of the BCxNy thin films.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Matthias Krause, Laurent Bedel, Anthony Taupeau, Ulrich Kreissig, Frans Munnik, Gintautas Abrasonis, Andreas Kolitsch, György Radnoczi, Zsolt Czigány, Annick Vanhulsel,