| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1668905 | Thin Solid Films | 2011 | 5 Pages |
Abstract
We prepared a sponge-like nanoporous silica film with a dense skin layer by the infiltration of silica precursor into nanoporous polystyrene-block-poly(methyl methacrylate) copolymer template followed by calcinations at high temperature. This film showed not only excellent antireflection at visible light wavelength range but also very good resistance to scratching compared with antireflection materials made of polymeric film. We expect that this film could be used for antireflection film with anti-scratching property for flat panel displays or touch panels.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Wonchul Joo, Youngsuk Kim, Sangshin Jang, Jin Kon Kim,