| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1669124 | Thin Solid Films | 2010 | 5 Pages |
Abstract
The impact of two organic contamination modes of toluene on the damage characteristics of a high reflective film (HR) at 1064 nm is investigated. The laser-induced damage modifications of HR films are locally analyzed by the Raman techniques, optical microscopy and scanning electron microscopy (SEM). It is found that liquid phase toluene decreases laser-induced damage threshold (LIDT) and gaseous phase toluene seems to be benign and increases the LIDT of the HR film. A possible damage mechanism is analyzed and discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Xiulan Ling, Yuanan Zhao, Jianda Shao, Zhengxiu Fan,
