Direct patterning of dense cerium oxide thin film by developed ink-jet deposition method at moderate temperatures

Direct fabrication of ceria film and patterns were conducted by an ink-jet deposition method where a precursor solution was jetted towards a heated substrate (≤ 300 °C) according to the required pattern without any post heat treatments. X-ray diffraction and Raman spectroscopic analyses revealed that the formed phases were crystallized CeO2 without any impurity phases and consisted of nanosized crystallites of < 10 nm. The thicknesses were several hundred nanometers and the width of the patterns was about 350 µm. The film was dense and showed a high optical transparency in the visible region(> 90%). Scanning electron microscopic analysis revealed that thin film patterns were free of cracks and all the films showed good adherence to the substrate.