Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1669217 | Thin Solid Films | 2011 | 5 Pages |
Abstract
Films of mixed nickel-tungsten oxide, denoted NixW1−x oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x < 0.50 the films comprised a mixture of amorphous WO3 and nanosized NiWO4, at x = 0.50 the nanosized NiWO4 phase was dominating, and at x > 0.50 the films contained nanosized NiO and NiWO4.
Keywords
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
S.V. Green, A. Kuzmin, J. Purans, C.G. Granqvist, G.A. Niklasson,