| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1669353 | Thin Solid Films | 2010 | 4 Pages |
Abstract
LiAlxOy films with thicknesses of 65–200 nm were deposited by the atomic layer deposition (ALD) technique on the LZ101 Mg–Li alloy. The ALD-deposited LiAlxOy films exhibit an amorphous structure and have an atomic ratios of Li:Al:O = 1:1:2. The potentio-dynamic polarization tests show that the corrosion resistance of Mg–Li alloys can be significantly improved due to the dense and pinhole-free structure as well as the excellent coverage and conformity of the ALD-deposited LiAlxOy films.
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Authors
P.C. Wang, Y.T. Shih, M.C. Lin, H.C. Lin, M.J. Chen, K.M. Lin,