Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1669436 | Thin Solid Films | 2010 | 5 Pages |
Abstract
A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO2 thin films on poly(ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H2O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield uniform, conformal, and pure ZrO2 thin films on polymer substrates at room temperature. The UV light was very effective to obtain the high-quality ZrO2 thin films with good adhesive strength on polymer substrates. The ZrO2 thin films exhibit large-scale uniformity, sharp interfaces, and unique electrical properties.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Byoung H. Lee, Sangho Cho, Jae K. Hwang, Su H. Kim, Myung M. Sung,