Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1669468 | Thin Solid Films | 2010 | 5 Pages |
Abstract
Atomic oxygen (AO) generation is experimentally and numerically investigated for in-situ plasma and post-plasma produced by dielectric barrier discharges (DBDs) for surface treatment. The AO generation in in-situ plasma inside a DBD reactor is closely related to the plasma characteristics depending on the applied voltage and O2 additive concentration, while the AO density distribution along the post-plasma ejected outside the reactor exit is influenced by the AO generation in the in-situ plasma, gas flow rate, and effluent distance. Contact angle measurements show that the metal surface characteristics, which are treated by in-situ plasma and post-plasma, respectively, are distinctive from each other depending on the AO densities.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Woo Seok Kang, Hyun-Su Kim, Sang Hee Hong,