| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1669589 | Thin Solid Films | 2009 | 4 Pages |
Abstract
This study synthesized the nanocrystalline diamond/amorphous carbon (NCD/a-C) composite films by the microwave plasma-enhanced chemical vapor deposition (MPCVD) system with Ar/CH4/N2 mixtures. A localized rectangular-type jet-electrode with high density plasma was used to enhance the formation of NCD/a-C films, and a maximum growth rate of 105.6 µm/h was achieved. The content variations of sp2 and sp3 phases via varying nitrogen gas flow rates were investigated by using Raman spectroscopy. The NCD/a-C film which synthesized with 6% nitrogen concentration and no hydrogen plasma etching treatment possessed a low turn-on electric field of 3.1 V/µm at the emission current of 0.01 µA.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Wen-Jen Liu, Xing-Jian Guo, Chi-Lung Chang, Cheng-Hsun Li, Chia-Wei Hsu,