| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1669667 | Thin Solid Films | 2010 | 7 Pages |
In situ and real time surface differential reflectance (SDR) spectroscopy is employed to study the growth of metallic Ag and/or dielectric Si3N4 films during deposition by magnetron sputtering. The measurements during Si3N4 sputtering allow determining both the refractive index and the deposition rate. During Ag sputtering, the SDR presents a maximum in the visible range, typical of a surface plasmon resonance (SPR) indicating the 3D growth of silver nanoclusters. After a certain deposition thickness, the SDR change corresponds to a continuous layer growth and allows determining the Ag deposition rate. During Ag/Si3N4 alternate deposition, the SDR spectroscopy enables to follow the SPR modifications (position, amplitude and width) not only during the formation of the Ag nanoclusters but also during their capping by a Si3N4 matrix and during intermediate steps (holding time after the silver sputtering, Si3N4 target ignition and pre-sputtering before the Si3N4 deposition) where significant changes are detected. It suggests possible nanocluster reshaping or physicochemical processes occurring at the nanocluster interface during the different steps.
