| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1669670 | Thin Solid Films | 2010 | 5 Pages |
Abstract
Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Terhi Hirvikorpi, Mika Vähä-Nissi, Tuomas Mustonen, Eero Iiskola, Maarit Karppinen,