Article ID Journal Published Year Pages File Type
1670061 Thin Solid Films 2010 6 Pages PDF
Abstract

Titanium dioxide thin films were deposited by Metallorganic Chemical Vapor Deposition at substrate temperatures ranging from 250 °C to 450 °C over soda lime glass and indium tin oxide coated glass substrates. X-ray diffraction studies show that films have a crystalline anatase structure at all the deposition temperatures. Particle size decreases and texture changes with the increase in substrate temperature. X-ray photoelectron spectroscopy confirms the appearance of a new well resolved state in the core level of Ti 2p spectrum shifted by 1.16 eV to lower binding energy due to the reduction of Ti+ 4 to Ti+ 3 upon litheation. Chronoamperometery, cyclic voltammetery and in situ UV–Vis spectrophotometeric studies were carried out on the prepared samples. Particle size and crystallinity control the electrochromic performance. The 350 °C film shows the highest ion storage capacity and the highest optical modulation along with an appreciable band gap broadening.

Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
Authors
, , ,