Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1670445 | Thin Solid Films | 2010 | 8 Pages |
Abstract
Titanium dioxide films were prepared by ultrasonic spray pyrolysis on (0001) α-quartz substrates at 400 °C and/or annealed in air at 600°, 800°, or 1000 °C. The as-deposited films at 400 °C (50 nm grains) and annealed at 600 °C (100 nm grains) showed single-phase anatase of high transparency in the visible region. Films annealed at 800 °C and 1000 °C showed mixed-phase anatase (100 nm grains) plus rutile (700 nm agglomerates) and pure rutile, (700 nm grains), respectively. Raman and X-ray data indicate the presence of residual stress in the films, which may arise from contamination, silicon diffusion into the films, and/or oxygen deficiency.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
A. Nakaruk, D. Ragazzon, C.C. Sorrell,