| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1670615 | Thin Solid Films | 2010 | 5 Pages |
Abstract
A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Maria Elena Fragalà , Cristina Satriano, Yana Aleeva, Graziella Malandrino,