Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1670736 | Thin Solid Films | 2009 | 5 Pages |
Abstract
Transparent and conducting thin films of TiO2:Nb were prepared on glass by reactive dc magnetron sputtering in Ar + O2. Post-deposition annealing in vacuum at 450 °C led to good electrical conductivity and optical transparency. The optical properties in the sub-bandgap region were in good agreement with Drude free electron theory, which accounts for intraband absorption. The band gap of the films was found to be in the range of 3.3 to 3.5 eV and signifies the onset of interband absorption. Electrical conductivities in the 10â 3 Ω cm range were obtained both from dc electrical measurements and from analysis of the optical measurements.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
C.M. Maghanga, G.A. Niklasson, C.G. Granqvist,