Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1671031 | Thin Solid Films | 2009 | 6 Pages |
Abstract
A microwave excited atmospheric pressure plasma source was manufactured and a cleaning experiment involving a stainless steel plate contaminated with organic oil was conducted, while considering the radical density in the Ar, Ar–O2, and Ar–H2O plasma. The most notable cleaning effect was confirmed when the plasma contained water molecules. While the existence of a unique spatial distribution of OH radical was demonstrated, the relevance of the cleaning effect and radical density was confirmed. The radical density distribution was examined by numerical computation using the experimentally obtained plasma parameter.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Shigeru Ono, Shinriki Teii, Yuta Suzuki, Takuya Suganuma,