| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1671243 | Thin Solid Films | 2010 | 4 Pages |
Abstract
Accelerator based MeV ion implantation of Ca2+ and P2+ into the titanium substrate to form hydroxyapatite (HA) has been carried out. Calcium hydroxide was formed after heating the calcium implanted titanium in air at 80 °C for 3 h. Upon subsequent annealing for 5 min at 600 °C HA was formed on the surface. Penetration depth of the HA layer in this method is much higher as compared to keV ion implantation. By elemental analysis, Ca/P ratio of the HA was found to be 1.76 which is higher than the ideal 1.67. This higher Ca/P ratio is attributed to the higher penetration depth of the MeV technique used.
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Authors
Tapash R. Rautray, R. Narayanan, Tae-Yub Kwon, Kyo-Han Kim,