Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1671313 | Thin Solid Films | 2009 | 4 Pages |
Abstract
TbMnO3/n-Si (n-N) and TbMnO3/p-Si (p-n) heterojunctions were fabricated under identical conditions. Good rectifying characteristics were found with almost the same forward current-voltage behavior in a temperature range from 150 to 300Â K. Such intriguing superposed rectifying behaviours at the interfaces between TbMnO3 and Si of two different doped types can be explained by a similar Schottky barrier diode behavior with its current-voltage dependence generally dominated by only one type of carrier. This work will favor both electronic transport analysis and future device applications.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Yimin Cui, Rongming Wang,