| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1671412 | Thin Solid Films | 2008 | 5 Pages |
Abstract
Interaction between hydrogen plasma and hydrogenated amorphous carbon films was investigated. The changes in the bonding configuration of the hydrocarbon species due to the hydrogen plasma treatments were investigated by using infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS). Further, to reinforce the results, etching rates were also investigated. These results suggested that the hydrogen ions generated in the plasma physically etched the amorphous carbon film at the high rate; on the other hand, the hydrogen radicals also etched the hydrogenated film at the low rate through hydrogenation of the film.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Masanori Shinohara, Ken Cho, Hiromichi Shibata, Keishi Okamoto, Tatsuyuki Nakatani, Yoshinobu Matsuda, Hiroshi Fujiyama,