| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1671420 | Thin Solid Films | 2008 | 5 Pages |
Abstract
We developed a VHF plasma source using a balanced power feeding method and investigated the characteristics of the VHF plasma with the Langmuir probe. It was found that the new VHF plasma source provides higher electron density plasma that is favorable for increasing the deposition rate of microcrystalline silicon films.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
T. Nishimiya, Y. Takeuchi, Y. Yamauchi, H. Takatsuka, T. Shioya, H. Muta, Y. Kawai,