| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1671612 | Thin Solid Films | 2007 | 5 Pages |
Abstract
The influence of the substrate nature on the structure and morphology of ITO thin films grown by thermal evaporation in vacuum is investigated. The as-prepared metal films with Sn/In molar ratio of 0.1 were subsequently annealed for 2 h at 723 K in air (to obtain tin doped indium oxide), then annealed in vacuum at 523 K, followed by UV irradiation (to reduce the electrical resistivity). Irrespective of substrate nature, XRD data evidence a (222) preferential orientation in films. Substrate nature, annealing in vacuum and UV irradiation influence the structure, morphology, optical, electrical and surface wetting properties of the films' surface.
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Authors
M. Purica, F. Iacomi, C. Baban, P. Prepelita, N. Apetroaei, D. Mardare, D. Luca,