Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1671637 | Thin Solid Films | 2007 | 4 Pages |
Abstract
Effects of atomic ratio of Zn:N:Al and solution concentration on the structural and electrical characteristic of ZnO films deposited by Ultrasonic Spray Pyrolysis using N-Al co-doping technique were investigated. Hall measurement indicated that with increasing Al doping, conductive type of ZnO thin films changed from n-type to p-type and then to n-type again. However, the solution concentration almost has no effect on the structural and electrical properties of p-type ZnO films. X-ray Photoelectron Spectroscopy indicated that the presence of Al indeed facilitates the incorporation of N through the formation of N-Al bonds in co-doped ZnO films. In addition, Photoluminescence spectra showed p-type ZnO films with a low density of native defects.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Xiaodan Zhang, Hongbing Fan, Jian Sun, Ying Zhao,