| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1671769 | Thin Solid Films | 2010 | 4 Pages |
Abstract
ZrNx films were deposited by radiofrequency reactive magnetron sputtering technique in nitrogen and water vapour atmosphere varying the working temperature from room temperature to 600 °C. The films' physical properties were investigated using X-ray diffraction, Secondary Ion Mass Spectroscopy, Atomic Force Microscopy and Transmission Electron Microscopy. It was found that the increase of temperature caused a decrease in the oxygen incorporation and a transition from cubic phase of Zr2ON2 to ZrN one. The formation of nanosized crystalline particles dispersed in the amorphous matrix was observed.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
M.A. Signore, A. Rizzo, L. Tapfer, E. Piscopiello, L. Capodieci, A. Cappello,