Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1671858 | Thin Solid Films | 2009 | 5 Pages |
In this study, we have synthesized N-doped ß-Ga2O3 nanowires on a p-type Si (100) substrate at the temperature of 850 °C through evaporation to modulate the spectra of the luminescence emission. Both TEM and XRD analyses confirmed that N-doped ß-Ga2O3 is monoclinic with a uniform mean diameter of 30 nm and a length up to several tens of micrometers. As determined by selected area diffraction (SAD), the growth direction of N-doped ß-Ga2O3 nanowires is [002]. The optical properties of the N-doped ß-Ga2O3 nanowires were studied by cathodoluminescence (CL) at the 10 and 300 K, exhibiting a UV and red light emission as a function of the nitrogen dopant. The results serve to reinforce the potential of N-doped ß-Ga2O3 nanowires for optoelectronic device applications.