Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1672263 | Thin Solid Films | 2009 | 6 Pages |
Abstract
The realization of crystalline films of Nd3+:YF3 and Nd3+:LiYF4 on a monocrystalline LiYF4 substrate by pulsed laser deposition is reported. The films were obtained by laser ablation with 355 nm photons of a bulk LiYF4 crystal doped with Nd3+ ions at 1.5% atomic concentration in the presence of different ablation/deposition parameters. The films optical characteristics, analyzed via laser induced polarized fluorescence spectroscopy upon IR excitation, are presented. Lifetime measurements of the fundamental Nd3+ ion transition in the film were also performed. All these results were compared with those obtained in the Nd3+:LiYF4 bulk crystal. The surface morphology of the depositions was analyzed via a scanning electron microscope. When the production of the deposition took place in high vacuum (1 Ã 10â 4 Pa) and the substrate temperature was 750 °C, the grown film was Nd3+:YF3. A 1 Pa controlled atmosphere of He in the ablation chamber and a substrate temperature of 650 °C favoured the growth of a Nd3+:LiYF4 film. In the latter case the film showed also a smoother surface.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
S. Barsanti, M. Anwar-ul-Haq, P. Bicchi,