Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1672381 | Thin Solid Films | 2008 | 5 Pages |
Abstract
Polymeric perfluorocarbon was deposited on the Si, Ag and Al substrates in Ar/c-C4F8 plasmas under a deposition rate of 10 nm/h for seven hours. The X-ray photoelectron spectra and atomic force microscope images of the deposited materials were observed. As a result, it has been found that the surface structure and chemical bonding of the deposited materials are remarkably different from each other, depending on the kind of substrate.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Kenji Furuya, Ryoichi Nakanishi, Hiroshi Okumura, Makoto Makita, Akira Harata,