Preparation and characterization of nanostructured ZrO2 coatings on dense and porous substrates

Nanostructured ZrO2 coatings are prepared on both dense and porous substrates by wet-chemical deposition of non-agglomerated 5 nm precursor particle dispersions, followed by thermal processing. The precursor particle dispersions are made by modified emulsion precipitation and a purification treatment to remove reaction products and additives. The coatings are formed by depositing the precursor nanoparticle dispersion directly onto the substrate, followed by drying and heating at 600 °C. Scanning electron microscopy and cross-sectional transmission electron microscopy observations of the heat-treated coatings indicate that the ZrO2 coating on dense Si wafer substrate has a homogeneous, dense particle packing structure with shallow meniscus-shaped depressions in the surface, and microcracks below the meniscus surface. On the other hand, coatings formed on a meso-porous γ-alumina membrane substrate are free of defects, but with a lower packing density. The mechanism of the substrate effect on the particle packing behavior and defect formation during coating deposition is discussed. It is expected that by using a thin porous substrate with reduced capillary force, a defect-free, homogenously dense-packed coating structure can be achieved.