Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1673011 | Thin Solid Films | 2007 | 5 Pages |
Abstract
Thin films of niobium nitride were deposited on high speed steel substrate by cathodic arc physical vapor deposition using − 150 V, − 200 V and − 250 V bias voltages at 1 Pa nitrogen pressure. X-ray diffraction data showed that hexagonal δ-niobium nitride was formed for all bias voltages. Fracture cross-sections revealed the existence of the transition zone structure in all coatings. The maximum hardness was found to be 39 GPa. The Rockwell C adhesion and the scratch test were used to compare adhesion properties. In Rockwell adhesion test the best adhesion was obtained at − 150 V bias voltage and in scratch test the cracks were occurred approximately at 3–5 Ns.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
N. Cansever,