Article ID Journal Published Year Pages File Type
1673011 Thin Solid Films 2007 5 Pages PDF
Abstract

Thin films of niobium nitride were deposited on high speed steel substrate by cathodic arc physical vapor deposition using − 150 V, − 200 V and − 250 V bias voltages at 1 Pa nitrogen pressure. X-ray diffraction data showed that hexagonal δ-niobium nitride was formed for all bias voltages. Fracture cross-sections revealed the existence of the transition zone structure in all coatings. The maximum hardness was found to be 39 GPa. The Rockwell C adhesion and the scratch test were used to compare adhesion properties. In Rockwell adhesion test the best adhesion was obtained at − 150 V bias voltage and in scratch test the cracks were occurred approximately at 3–5 Ns.

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Physical Sciences and Engineering Materials Science Nanotechnology
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