Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1673032 | Thin Solid Films | 2007 | 5 Pages |
Abstract
Indium tin oxide thin films were prepared by a chemical solution deposition route based on a one pot reaction of indium acetate, tin tetrachloride pentahydrate and propionic acid. The films were heat-treated in oxidising atmosphere and post-annealed in forming gas containing 10% hydrogen. It was found that the coating solution concentration exerted a major influence on the morphology of the films. Low-concentrated solutions yielded layers with columnar structure while higher molarities led to fine-grained granular films. Under optimised conditions, thin films of indium tin oxide exhibiting a resistivity of 1 · 10− 3 Ω cm were obtained. The transparency was determined to a high level of above 90% in the entire visible range of the spectrum.
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Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Ann-Christin Dippel, Theodor Schneller, Peter Gerber, Rainer Waser,