Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1673076 | Thin Solid Films | 2008 | 4 Pages |
Abstract
The photolithography process has generally been used for the making of catalyst layers used for the synthesis of CNTs due to its comparative ease. However, this method results in the formation of undesirable catalyst particles, which deteriorate the quality of the devices. Therefore, we tried to form a catalyst layer without using any lift-off or wet etching process, especially for the formation of carbon nanotube interconnects. After spin coating the samples, which were previously fabricated with several vias, with an iron-acetate solution, the catalyst layer was pulled down into the bottom of the holes through the force of gravity. We were able to remove the catalyst layer which was coated over undesirable areas, by TMAH (tetramethylammonium hydroxide, N(CH3)4OH) treatment. After the catalyst deposition process, we synthesized CNTs and observed them by scanning electron microscopy (SEM).
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Do-Yoon Kim, Hyun-Chul Lee, Jong-Hak Lee, Jae-Hong Park, Prashant S. Alegaonkar, Ji-Beom Yoo, In-Taek Han, Ha-Jin Kim, Yong-Wan Jin, Jong-Min Kim, Kee-Won Kwon,