| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1673101 | Thin Solid Films | 2008 | 5 Pages |
Abstract
Quaternary TiZrAlN nanocomposite thin films were deposited by Closed-Field Unbalanced Magnetron Sputtering (CFUBMS), and their microstructure and mechanical properties were examined. The grain refinement of the TiZrAlN nanocomposite thin films was controlled by adjusting the N2 partial pressure. The hardness of the film varied with the N2 partial pressure with a maximum value of approximately 47 GPa. A critical grain size, dc, was found to be essential for maximizing the hardness.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Youn J. Kim, Ho Y. Lee, Tae J. Byun, Jeon G. Han,