| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1673176 | Thin Solid Films | 2009 | 5 Pages |
The electrochemical properties of TiN film coated on AISI 316 stainless steel (SS) by the magnetron sputtering physical vapor deposition (PVD) were studied for application as a bipolar plate. The crystal structure and surface morphology of the coatings were examined by x-ray diffractometry (XRD) and atomic force microscopy (AFM), respectively. The corrosion behaviors of the TiN films were investigated by electrochemical methods, including potentiodynamic polarization test and electrochemical impedance spectroscopy (EIS) under + 600 mVSCE application. The electrochemical behavior of the TiN coatings was enhanced with increasing bias voltage due to lower corrosion current density and higher Rct values during an immersion time of 168 h. This result was attributed to the formation of crystalline-refined TiN(200) at high bias voltage, which increased the coating compactness and the protective efficiency, and decreased passive current density.
