Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1673196 | Thin Solid Films | 2009 | 4 Pages |
Abstract
This research presents a simulation-based methodology to accurately predict interfacial adhesion behaviors of heterostructures. Validation of the proposed approach is achieved through comparison of 4-point bending test results on interfaces of multiple stacked low-k films with those of theoretical solutions from the finite element analysis. Impact induced by the compliance of 4-point bending test system can be neglected using the averaged energy release rate of various crack lengths in simulations. On the basis of precise predictions drawn from the considered analyses, uncertainty of experimental tests for the nano-scale fractured strength could be promptly observed and estimated.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Chang-Chun Lee, Jacky Huang, Shu-Tong Chang, Wei-Ching Wang,