Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1673451 | Thin Solid Films | 2008 | 5 Pages |
Abstract
Direct chemical vapor deposition of diamond on Fe–15%Cr steels modified by 5%Si, 5%Al, 5%Ti, 10%Mo and 10%Mn, 20%Cr (in wt.%), respectively, has been performed at 670 °C with a microwave plasma reactor. Only aluminum facilitates form dense, continuous and adherent diamond films with a maximum thickness of 3 μm, while diamond films grown on the rest substrates spontaneously delaminate after cooling down.
Keywords
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Y.S. Li, Q. Yang, C. Xiao, A. Hirose,