Article ID Journal Published Year Pages File Type
1673451 Thin Solid Films 2008 5 Pages PDF
Abstract

Direct chemical vapor deposition of diamond on Fe–15%Cr steels modified by 5%Si, 5%Al, 5%Ti, 10%Mo and 10%Mn, 20%Cr (in wt.%), respectively, has been performed at 670 °C with a microwave plasma reactor. Only aluminum facilitates form dense, continuous and adherent diamond films with a maximum thickness of 3 μm, while diamond films grown on the rest substrates spontaneously delaminate after cooling down.

Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
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