| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1673617 | Thin Solid Films | 2007 | 5 Pages |
Abstract
TiZrV films, grown at the deposition angles of 0° and 70°, were used for the study of the oxygen-adsorption process. When the deposition angle is 0°, the appearance of the film is dense columnar structure. However, the film grown at the glancing angle of 70° is composed of porous and isolated columns, which are made of fine clusters. The activated TiZrV films have the capability to absorb oxygen at room temperature. The component Zr is more easily oxidized than Ti and V components when the TiZrV film is exposed in oxygen. The content of oxidized Ti and oxidized V does not linearly increase with the increase of oxygen exposure when there is a metallic Zr component on the surface of the film.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Chien-Cheng Li, Jow-Lay Huang, Ran-Jin Lin, Ding-Fwu Lii, Chia-Hao Chen,