Article ID Journal Published Year Pages File Type
1673620 Thin Solid Films 2007 5 Pages PDF
Abstract

Thin films of alumina were deposited by alternate-current inverted magnetron sputtering at 350 °C on stainless steel substrates. Chromium oxide was used as a template layer because it can be deposited at low temperatures and has a low lattice mismatch with alpha alumina. X-ray diffraction and selected area electron diffraction results showed that pure alpha alumina coatings could be grown at 6 kW and 0.5 % partial pressure of oxygen. Cross-sectional transmission electron microscopy analysis showed a crystalline layer of alumina on top of the chromium oxide layer. Pure alpha alumina could be grown if deposited for 2 h. Layers with mixed phases of alpha and gamma alumina were obtained with other deposition parameters.

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Physical Sciences and Engineering Materials Science Nanotechnology
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