Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1673620 | Thin Solid Films | 2007 | 5 Pages |
Abstract
Thin films of alumina were deposited by alternate-current inverted magnetron sputtering at 350 °C on stainless steel substrates. Chromium oxide was used as a template layer because it can be deposited at low temperatures and has a low lattice mismatch with alpha alumina. X-ray diffraction and selected area electron diffraction results showed that pure alpha alumina coatings could be grown at 6 kW and 0.5 % partial pressure of oxygen. Cross-sectional transmission electron microscopy analysis showed a crystalline layer of alumina on top of the chromium oxide layer. Pure alpha alumina could be grown if deposited for 2 h. Layers with mixed phases of alpha and gamma alumina were obtained with other deposition parameters.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
A. Aryasomayajula, S. Canovic, D. Bhat, M.H. Gordon, M. Halvarsson,