Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1673672 | Thin Solid Films | 2006 | 4 Pages |
Abstract
Inorganic–organic materials composed of TiO2/SiO2/polydimethylsiloxane with several molar ratios of the precursors in the starting solution have been studied. The thickness of the layers ranges from 1.2 μm to 400 nm, depending on the burning temperature and on the composition of the layers. The results indicate that the decrease of the concentration of TiO2 does not have a critical impact on the speed of photodegradation, for the molar ratio TiO2/PDMS equal to 0.25/0.5 or higher. When the amount of SiO2 decreases, the chemical resistance decreases, too.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
P. Novotná, J. Matoušek,